{"id":1810,"date":"2023-08-21T20:35:29","date_gmt":"2023-08-21T18:35:29","guid":{"rendered":"http:\/\/localhost:8888\/progetti\/laramed\/?page_id=1810"},"modified":"2024-03-19T16:04:56","modified_gmt":"2024-03-19T15:04:56","slug":"ms","status":"publish","type":"page","link":"https:\/\/web.infn.it\/LARAMED\/ms\/","title":{"rendered":"Magnetron Sputtering"},"content":{"rendered":"<style>.wp-block-kadence-advancedheading.kt-adv-heading1810_5f6dd1-97, .wp-block-kadence-advancedheading.kt-adv-heading1810_5f6dd1-97[data-kb-block=\"kb-adv-heading1810_5f6dd1-97\"]{text-align:center;font-size:var(--global-kb-font-size-md, 1.25rem);font-style:normal;}.wp-block-kadence-advancedheading.kt-adv-heading1810_5f6dd1-97 mark.kt-highlight, .wp-block-kadence-advancedheading.kt-adv-heading1810_5f6dd1-97[data-kb-block=\"kb-adv-heading1810_5f6dd1-97\"] mark.kt-highlight{font-style:normal;color:#f76a0c;-webkit-box-decoration-break:clone;box-decoration-break:clone;padding-top:0px;padding-right:0px;padding-bottom:0px;padding-left:0px;}.wp-block-kadence-advancedheading.kt-adv-heading1810_5f6dd1-97 img.kb-inline-image, .wp-block-kadence-advancedheading.kt-adv-heading1810_5f6dd1-97[data-kb-block=\"kb-adv-heading1810_5f6dd1-97\"] img.kb-inline-image{width:150px;vertical-align:baseline;}<\/style>\n<h2 class=\"kt-adv-heading1810_5f6dd1-97 wp-block-kadence-advancedheading\" data-kb-block=\"kb-adv-heading1810_5f6dd1-97\"><strong>Magnetron Sputtering <\/strong><\/h2>\n\n\n\n<div class=\"wp-block-columns is-layout-flex wp-container-core-columns-is-layout-9d6595d7 wp-block-columns-is-layout-flex\">\n<div class=\"wp-block-column is-layout-flow wp-block-column-is-layout-flow\" style=\"flex-basis:33.33%\">\n<figure class=\"wp-block-image size-large\"><img fetchpriority=\"high\" decoding=\"async\" width=\"1024\" height=\"731\" src=\"https:\/\/web.infn.it\/LARAMED\/wp-content\/uploads\/2023\/11\/sputtering_schema-1024x731.jpg\" alt=\"Schematic description of a magnetron sputtering process\" class=\"wp-image-2080\" srcset=\"https:\/\/web.infn.it\/LARAMED\/wp-content\/uploads\/2023\/11\/sputtering_schema-1024x731.jpg 1024w, https:\/\/web.infn.it\/LARAMED\/wp-content\/uploads\/2023\/11\/sputtering_schema-1536x1096.jpg 1536w, https:\/\/web.infn.it\/LARAMED\/wp-content\/uploads\/2023\/11\/sputtering_schema-2048x1461.jpg 2048w, https:\/\/web.infn.it\/LARAMED\/wp-content\/uploads\/2023\/11\/sputtering_schema-300x214.jpg 300w, https:\/\/web.infn.it\/LARAMED\/wp-content\/uploads\/2023\/11\/sputtering_schema-768x548.jpg 768w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/><figcaption class=\"wp-element-caption\">Schematic description of a magnetron sputtering process in down-top configuration: in a vacuum chamber inert gas plasma (<strong>Ar<\/strong>) is created when a difference in potential is applied between the cathode (the material to be deposited) and the substrate (anode). The positive ions of the inert gas are accelerated toward the cathode. When the ions collide with the atoms of the sputtering target, the energy transfer causes the detachment of some atoms, which are then deposited on the substrate. Magnetron sputtering is characterized by elevated plasma use efficiency due to its magnetic confinement.<\/figcaption><\/figure>\n\n\n\n<figure class=\"wp-block-image size-large\"><img decoding=\"async\" width=\"1024\" height=\"771\" src=\"https:\/\/web.infn.it\/LARAMED\/wp-content\/uploads\/2023\/11\/sputtering_plasma-1024x771.jpg\" alt=\"Example of plasma during the sputtering process of Molybdenum\" class=\"wp-image-2081\" srcset=\"https:\/\/web.infn.it\/LARAMED\/wp-content\/uploads\/2023\/11\/sputtering_plasma-1024x771.jpg 1024w, https:\/\/web.infn.it\/LARAMED\/wp-content\/uploads\/2023\/11\/sputtering_plasma-1536x1157.jpg 1536w, https:\/\/web.infn.it\/LARAMED\/wp-content\/uploads\/2023\/11\/sputtering_plasma-300x226.jpg 300w, https:\/\/web.infn.it\/LARAMED\/wp-content\/uploads\/2023\/11\/sputtering_plasma-768x578.jpg 768w, https:\/\/web.infn.it\/LARAMED\/wp-content\/uploads\/2023\/11\/sputtering_plasma.jpg 1781w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/><figcaption class=\"wp-element-caption\">Example of plasma during the sputtering process of <strong>Molybdenum<\/strong>.<\/figcaption><\/figure>\n<\/div>\n\n\n\n<div class=\"wp-block-column is-layout-flow wp-block-column-is-layout-flow\" style=\"flex-basis:66.66%\">\n<p class=\"has-theme-palette-3-color has-text-color has-link-color wp-elements-0e77d37ba56258d917fe8e0e9c335386\" style=\"font-size:18px\">The application of Magnetron Sputtering (MS) technique to obtain a solid target was the subject of an\u00a0<a href=\"https:\/\/web.infn.it\/LARAMED\/patents\/\" data-type=\"page\" data-id=\"181\">INFN patent<\/a> (n. WO\/2019\/053570)\u00a0and its enhancement was carried out in the framework of\u00a0<a href=\"https:\/\/web.infn.it\/LARAMED\/totem\/\" data-type=\"page\" data-id=\"1901\">INTEFF_TOTEM<\/a> project.\u00a0<br>MS system seems very promising technique because it allows the deposition of thin and thick layer onto several backing plate materials with a good adhesion. However, the material loss issues should be deeper investigated in order to make this technology attractive for the expensive isotopically enriched materials.<\/p>\n\n\n<div class=\"wp-block-image\">\n<figure class=\"alignleft size-large is-resized\"><img decoding=\"async\" width=\"1024\" height=\"370\" src=\"https:\/\/web.infn.it\/LARAMED\/wp-content\/uploads\/2023\/11\/sputtering_targets-1024x370.jpg\" alt=\"Target Examples\" class=\"wp-image-2082\" style=\"width:333px;height:auto\" srcset=\"https:\/\/web.infn.it\/LARAMED\/wp-content\/uploads\/2023\/11\/sputtering_targets-1024x370.jpg 1024w, https:\/\/web.infn.it\/LARAMED\/wp-content\/uploads\/2023\/11\/sputtering_targets-1536x555.jpg 1536w, https:\/\/web.infn.it\/LARAMED\/wp-content\/uploads\/2023\/11\/sputtering_targets-2048x739.jpg 2048w, https:\/\/web.infn.it\/LARAMED\/wp-content\/uploads\/2023\/11\/sputtering_targets-300x108.jpg 300w, https:\/\/web.infn.it\/LARAMED\/wp-content\/uploads\/2023\/11\/sputtering_targets-768x277.jpg 768w\" sizes=\"(max-width: 1024px) 100vw, 1024px\" \/><figcaption class=\"wp-element-caption\">Target Examples<\/figcaption><\/figure>\n<\/div>\n\n\n<p class=\"has-theme-palette-3-color has-text-color has-link-color wp-elements-232a261cd331a21aa84db2b298eb0ed0\" style=\"font-size:18px\"><strong>MS advantages:<\/strong><\/p>\n\n\n\n<ul class=\"has-theme-palette-3-color has-text-color has-link-color wp-block-list wp-elements-71ab5b7f8982789293e9ac520cd2aa7a\">\n<li>Deposition&nbsp;onto&nbsp;almost&nbsp;any&nbsp;support material<\/li>\n\n\n\n<li>Excellent adhesion on substrate<\/li>\n\n\n\n<li>High thickness range (0.1 \u00b5m \u2013 1 mm)<\/li>\n\n\n\n<li>High deposition uniformity<\/li>\n<\/ul>\n\n\n\n<ul class=\"has-theme-palette-3-color has-text-color has-link-color has-small-font-size wp-block-list wp-elements-01c6ff6e8c4551fff822d164d3e0be8b\">\n<ul class=\"has-theme-palette-3-color has-text-color has-link-color has-small-font-size wp-block-list wp-elements-5c485e76a69ed3c14120943be487c73b\">\n<li><em>More information can be found here:<\/em><\/li>\n\n\n\n<li>Kotliarenko, A.;&nbsp;Azzolini, O.; Cisternino, S.; El&nbsp;Idrissi, M.; Esposito, J.; Keppel, G.; Pira, C.;&nbsp;Taibi, A. First Results on Zinc Oxide Thick Film Deposition by Inverted Magnetron Sputtering for Cyclotron Solid Targets Production.&nbsp;<em>Materials<\/em>&nbsp;<strong>2023<\/strong>,&nbsp;<em>16<\/em>, 3810, doi:10.3390\/ma16103810.<\/li>\n\n\n\n<li>Kotliarenko, A.;&nbsp;Azzolini, O.; Keppel, G.; Pira, C.; Esposito, J. Investigation of a Possible Material-Saving Approach of Sputtering Techniques for Radiopharmaceutical Target Production.&nbsp;<em>Applied Sciences<\/em>&nbsp;<strong>2021<\/strong>,&nbsp;<em>11<\/em>, 9219, doi:10.3390\/app11199219.<\/li>\n\n\n\n<li>Skliarova, H.; Cisternino, S.; Cicoria, G.; Marengo, M.; Cazzola, E.; Gorgoni, G.; Palmieri, V.&nbsp;Medical&nbsp;Cyclotron&nbsp;Solid Target&nbsp;Preparation&nbsp;by&nbsp;Ultrathick&nbsp;Film Magnetron&nbsp;Sputtering&nbsp;Deposition.&nbsp;<em>Instruments<\/em>&nbsp;<strong>2019<\/strong>,&nbsp;<em>3<\/em>, 21, doi:10.3390\/instruments3010021.<\/li>\n\n\n\n<li>Skliarova, H.; Cisternino, S.;&nbsp;Cicoria, G.; Marengo, M.; Palmieri, V. Innovative Target for Production of Technetium-99m by Biomedical Cyclotron.&nbsp;<em>Molecules<\/em>&nbsp;<strong>2019<\/strong>,&nbsp;<em>24<\/em>, 25, doi:10.3390\/molecules24010025.<\/li>\n\n\n\n<li>Palmieri, V.; Skliarova, H.; Cisternino, S.; Marengo, M.;&nbsp;Cicoria, G. Method for Obtaining a Solid Target for Radiopharmaceuticals Production. Patent WO\/2019\/053570. ISTITUTO NAZIONALE DI FISICA NUCLEARE. 22 March 2019.<\/li>\n<\/ul>\n<\/ul>\n<\/div>\n<\/div>\n\n\n<style>.wp-block-kadence-advancedbtn.kb-btns1810_99a551-da{gap:var(--global-kb-gap-xs, 0.5rem );justify-content:center;align-items:center;}.kt-btns1810_99a551-da .kt-button{font-weight:normal;font-style:normal;}.kt-btns1810_99a551-da .kt-btn-wrap-0{margin-right:5px;}.wp-block-kadence-advancedbtn.kt-btns1810_99a551-da .kt-btn-wrap-0 .kt-button{color:#555555;border-color:#555555;}.wp-block-kadence-advancedbtn.kt-btns1810_99a551-da .kt-btn-wrap-0 .kt-button:hover, .wp-block-kadence-advancedbtn.kt-btns1810_99a551-da .kt-btn-wrap-0 .kt-button:focus{color:#ffffff;border-color:#444444;}.wp-block-kadence-advancedbtn.kt-btns1810_99a551-da .kt-btn-wrap-0 .kt-button::before{display:none;}.wp-block-kadence-advancedbtn.kt-btns1810_99a551-da .kt-btn-wrap-0 .kt-button:hover, .wp-block-kadence-advancedbtn.kt-btns1810_99a551-da .kt-btn-wrap-0 .kt-button:focus{background:#444444;}<\/style>\n<div class=\"wp-block-kadence-advancedbtn kb-buttons-wrap kb-btns1810_99a551-da\"><style>ul.menu .wp-block-kadence-advancedbtn .kb-btn1810_be2f4e-ac.kb-button{width:initial;}.wp-block-kadence-advancedbtn .kb-btn1810_be2f4e-ac.kb-button{color:var(--global-palette3, #1A202C);background:var(--global-palette8, #F7FAFC);border-top-left-radius:5px;border-top-right-radius:5px;border-bottom-right-radius:5px;border-bottom-left-radius:5px;border-top:2px solid;border-right:2px solid;border-bottom:2px solid;border-left:2px solid;}@media all and (max-width: 1024px){.wp-block-kadence-advancedbtn .kb-btn1810_be2f4e-ac.kb-button{border-top:2px solid;border-right:2px solid;border-bottom:2px solid;border-left:2px solid;}}@media all and (max-width: 767px){.wp-block-kadence-advancedbtn .kb-btn1810_be2f4e-ac.kb-button{border-top:2px solid;border-right:2px solid;border-bottom:2px solid;border-left:2px solid;}}<\/style><a class=\"kb-button kt-button button kb-btn1810_be2f4e-ac kt-btn-size-standard kt-btn-width-type-auto kb-btn-global-fill  kt-btn-has-text-true kt-btn-has-svg-false  wp-block-kadence-singlebtn\" href=\"https:\/\/web.infn.it\/LARAMED\/target\/\"><span class=\"kt-btn-inner-text\">Back<\/span><\/a><\/div>\n\n\n\n<p><\/p>\n","protected":false},"excerpt":{"rendered":"<p>Magnetron Sputtering The application of Magnetron Sputtering (MS) technique to obtain a solid target was the subject of an\u00a0INFN patent (n. WO\/2019\/053570)\u00a0and its enhancement was carried out in the framework of\u00a0INTEFF_TOTEM project.\u00a0MS system seems very promising technique because it allows the deposition of thin and thick layer onto several backing plate materials with a good&#8230;<\/p>\n","protected":false},"author":4,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"_themeisle_gutenberg_block_has_review":false,"_kad_post_transparent":"","_kad_post_title":"","_kad_post_layout":"normal","_kad_post_sidebar_id":"","_kad_post_content_style":"","_kad_post_vertical_padding":"","_kad_post_feature":"","_kad_post_feature_position":"","_kad_post_header":false,"_kad_post_footer":false,"_kad_post_classname":"","footnotes":""},"class_list":["post-1810","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/web.infn.it\/LARAMED\/wp-json\/wp\/v2\/pages\/1810","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/web.infn.it\/LARAMED\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/web.infn.it\/LARAMED\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/web.infn.it\/LARAMED\/wp-json\/wp\/v2\/users\/4"}],"replies":[{"embeddable":true,"href":"https:\/\/web.infn.it\/LARAMED\/wp-json\/wp\/v2\/comments?post=1810"}],"version-history":[{"count":9,"href":"https:\/\/web.infn.it\/LARAMED\/wp-json\/wp\/v2\/pages\/1810\/revisions"}],"predecessor-version":[{"id":2974,"href":"https:\/\/web.infn.it\/LARAMED\/wp-json\/wp\/v2\/pages\/1810\/revisions\/2974"}],"wp:attachment":[{"href":"https:\/\/web.infn.it\/LARAMED\/wp-json\/wp\/v2\/media?parent=1810"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}