{"id":4481,"date":"2024-11-11T16:29:58","date_gmt":"2024-11-11T15:29:58","guid":{"rendered":"https:\/\/web.infn.it\/TechTransfer\/portfolio_page\/solid-target-for-radiopharmaceutical-production\/"},"modified":"2026-01-22T10:50:12","modified_gmt":"2026-01-22T09:50:12","slug":"solid-target-for-radiopharmaceutical-production","status":"publish","type":"portfolio_page","link":"https:\/\/web.infn.it\/TechTransfer\/en\/portfolio_page\/solid-target-for-radiopharmaceutical-production\/","title":{"rendered":"Solid target for radiopharmaceutical production"},"content":{"rendered":"

[vc_row css_animation=”” row_type=”row” use_row_as_full_screen_section=”no” type=”full_width” angled_section=”no” text_align=”left” background_image_as_pattern=”without_pattern”][vc_column][vc_raw_html]W3dwc2VvX2JyZWFkY3J1bWJd[\/vc_raw_html][vc_empty_space][vc_column_text]<\/p>\n

Solid target for radiopharmaceutical production<\/strong><\/h1>\n

[\/vc_column_text][vc_empty_space][\/vc_column][\/vc_row][vc_row css_animation=”” row_type=”row” use_row_as_full_screen_section=”no” type=”full_width” angled_section=”no” text_align=”left” background_image_as_pattern=”without_pattern”][vc_column width=”2\/3″][vc_empty_space][vc_column_text]Method for the creation of a solid target with a high level of heat exchange for the production of 99mTc by cyclotron. The target consists of an inert backing plate with high thermal conductivity, and an ultra-thick film of 100Mo deposited directly on the backing plate through the magnetron sputtering technique.[\/vc_column_text][vc_empty_space][vc_single_image image=”4482″ img_size=”full” qode_css_animation=””][vc_empty_space][vc_column_text]<\/p>\n

How does it work?<\/span><\/h3>\n

[\/vc_column_text][vc_empty_space][vc_column_text]The backing plate of the complex target is made by vacuum brazing of a thin layer of chemically inert dielectric material to a metal component with high thermal conductivity. The deposition of the precursor material for the production of the radionuclide (e.g. 100Mo for the production of 99mTc, 89Y for the production of 89Zr, etc.) is carried out using the magnetron sputtering technique in order to obtain a film with high density, uniformity, thickness and adhesion directly on the chemically inert layer. Optimization of the parameters used for the magnetron sputtering technique, in particular, inert gas pressure, substrate temperatures and multilayer deposition, make it possible to minimise the total stress in the system and ensure a high thickness of 100\u00b5m-1mm.[\/vc_column_text][vc_empty_space][vc_column_text]<\/p>\n

Applications<\/span><\/h3>\n

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