{"id":4518,"date":"2024-09-24T14:57:44","date_gmt":"2024-09-24T12:57:44","guid":{"rendered":"https:\/\/web.infn.it\/TechTransfer\/portfolio_page\/chemical-solution-containing-phosphorus-suitable-for-polishing-copper-and-its-alloys-by-plasma-electropolishing\/"},"modified":"2026-01-26T11:22:59","modified_gmt":"2026-01-26T10:22:59","slug":"chemical-solution-containing-phosphorus-suitable-for-polishing-copper-and-its-alloys-by-plasma-electropolishing","status":"publish","type":"portfolio_page","link":"https:\/\/web.infn.it\/TechTransfer\/en\/portfolio_page\/chemical-solution-containing-phosphorus-suitable-for-polishing-copper-and-its-alloys-by-plasma-electropolishing\/","title":{"rendered":"Chemical solution containing phosphorus suitable for polishing copper and its alloys by plasma electropolishing"},"content":{"rendered":"

[vc_row css_animation=”” row_type=”row” use_row_as_full_screen_section=”no” type=”full_width” angled_section=”no” text_align=”left” background_image_as_pattern=”without_pattern”][vc_column][vc_raw_html]W3dwc2VvX2JyZWFkY3J1bWJd[\/vc_raw_html][vc_empty_space][vc_column_text]<\/p>\n

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Chemical solution containing phosphorus suitable for polishing copper and its alloys by plasma electropolishing<\/h1>\n<\/div>\n<\/div>\n
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[\/vc_column_text][vc_empty_space][\/vc_column][\/vc_row][vc_row css_animation=”” row_type=”row” use_row_as_full_screen_section=”no” type=”full_width” angled_section=”no” text_align=”left” background_image_as_pattern=”without_pattern”][vc_column width=”2\/3″][vc_empty_space][vc_column_text]Aqueous phosphorus-based solution specifically for electropolishing copper and its alloys, which allows for better results than the traditional chemical or electrochemical polishing techniques.[\/vc_column_text][vc_empty_space][vc_single_image image=”4520″ img_size=”full” qode_css_animation=””][vc_empty_space][vc_column_text]<\/p>\n

How does it work?<\/span><\/h3>\n

[\/vc_column_text][vc_empty_space][vc_column_text]The invention allows a homogeneous polishing of Copper and its alloys via plasma electrolytic polishing whose results are comparable or better than those of traditional electropolishing. Polishing means increasing the reflective coefficient, the glossy effect of the surface, and decreasing micro- and macro-roughness values; in particular, this technology enables Ra<50 nm roughness values to be achieved.
\nPlasma electropolishing is an electrochemical polishing technique that, unlike standard electropolishing, works in a different regime, at higher currents and potentials, using more dilute solutions than the standard chemical or electrochemical techniques.[\/vc_column_text][vc_empty_space][vc_column_text]<\/p>\n

Applications<\/span><\/h3>\n

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