{"id":4649,"date":"2025-03-27T10:18:17","date_gmt":"2025-03-27T09:18:17","guid":{"rendered":"https:\/\/web.infn.it\/TechTransfer\/portfolio_page\/plasma-source-for-high-repetition-rate-accelerators\/"},"modified":"2026-02-04T11:54:27","modified_gmt":"2026-02-04T10:54:27","slug":"plasma-source-for-high-repetition-rate-accelerators","status":"publish","type":"portfolio_page","link":"https:\/\/web.infn.it\/TechTransfer\/en\/portfolio_page\/plasma-source-for-high-repetition-rate-accelerators\/","title":{"rendered":"Plasma source for high repetition rate accelerators"},"content":{"rendered":"<div class=\"wpb-content-wrapper\"><p>[vc_row css_animation=&#8221;&#8221; row_type=&#8221;row&#8221; use_row_as_full_screen_section=&#8221;no&#8221; type=&#8221;full_width&#8221; angled_section=&#8221;no&#8221; text_align=&#8221;left&#8221; background_image_as_pattern=&#8221;without_pattern&#8221;][vc_column][vc_raw_html]W3dwc2VvX2JyZWFkY3J1bWJd[\/vc_raw_html][vc_empty_space][vc_column_text]<\/p>\n<h1>Plasma source for high repetition rate accelerators<\/h1>\n<p>[\/vc_column_text][vc_empty_space][\/vc_column][\/vc_row][vc_row css_animation=&#8221;&#8221; row_type=&#8221;row&#8221; use_row_as_full_screen_section=&#8221;no&#8221; type=&#8221;full_width&#8221; angled_section=&#8221;no&#8221; text_align=&#8221;left&#8221; background_image_as_pattern=&#8221;without_pattern&#8221;][vc_column width=&#8221;2\/3&#8243;][vc_empty_space][vc_column_text]The present invention refers to the field of accelerators based on plasma technology. More particularly, the present invention refers to a plasma source for high repetition rate accelerators.[\/vc_column_text][vc_empty_space][vc_single_image image=&#8221;4650&#8243; img_size=&#8221;full&#8221; qode_css_animation=&#8221;&#8221;][vc_empty_space][vc_column_text]<\/p>\n<h3><span style=\"color: #20415c;\">How does it work?<\/span><\/h3>\n<p>[\/vc_column_text][vc_empty_space][vc_column_text]The invention solves the critical issues related to the use of materials capable of withstanding temperatures of the order of several tens of thousands of degrees, reached during the process for forming an electric arc. Furthermore, the present invention solves the critical issues of achieving high energy values. <\/p>\n<p>The invention covered by the patent involves a modular production step of the plasma source components. Said method, combined with the ease of machining of the materials identified, makes it possible to create plasma sources comprising longitudinal structures capable of overcoming the outlined problems.[\/vc_column_text][vc_empty_space][vc_column_text]<\/p>\n<h3><span style=\"color: #20415c;\">Applications<\/span><\/h3>\n<p>[\/vc_column_text][vc_column_text]<\/p>\n<ul>\n<li>Applications in the field of particle acceleration for the realisation of plasma sources<\/li>\n<\/ul>\n<p>[\/vc_column_text][vc_empty_space][vc_column_text]<\/p>\n<h3><span style=\"color: #20415c;\">Advantages<\/span><\/h3>\n<p>[\/vc_column_text][vc_column_text]<\/p>\n<ul>\n<li>Use at very high repetition rates (at least up to several hundred Hz).<\/li>\n<li>Extension of the average life of the plasma source.<\/li>\n<li>Cost reduction compared to materials such as sapphires or similar.<\/li>\n<\/ul>\n<p>[\/vc_column_text][\/vc_column][vc_column width=&#8221;1\/4&#8243; css=&#8221;.vc_custom_1702567488600{margin-bottom: 50px !important;background-color: #042a48 !important;}&#8221; el_class=&#8221;.column_details_portfolio&#8221;][vc_column_text]<\/p>\n<h4><span style=\"color: #ffffff;\">ADDITIONAL DETAILS<\/span><\/h4>\n<p>[\/vc_column_text][vc_empty_space][vc_column_text]<\/p>\n<h5><span style=\"color: #8bc9e0;\"><strong>PATENT OWNERS<\/strong><\/span><\/h5>\n<p style=\"color: #fff; font-weight: bold;\">INFN and University of Roma Sapienza<\/p>\n<p>[\/vc_column_text][vc_empty_space height=&#8221;21px&#8221;][vc_column_text]<\/p>\n<h5><span style=\"color: #8bc9e0;\"><strong>PRIORITY NUMBER<\/strong><\/span><\/h5>\n<p><strong><span style=\"color: #ffffff;\">IT 102024000027750 <\/span><\/strong>[\/vc_column_text][vc_empty_space height=&#8221;21px&#8221;][vc_column_text]<\/p>\n<h5><span style=\"color: #8bc9e0;\"><strong>TECHNOLOGY SECTOR <\/strong><\/span><\/h5>\n<p><strong><span style=\"color: #ffffff;\">Plasma accelerators<\/span><\/strong>[\/vc_column_text][vc_empty_space height=&#8221;21px&#8221;][vc_column_text]<\/p>\n<h5><span style=\"color: #8bc9e0;\"><strong>TT CODE<\/strong><\/span><\/h5>\n<p><strong><span style=\"color: #ffffff;\">P_24.061<\/span><\/strong>[\/vc_column_text][vc_empty_space][vc_row_inner row_type=&#8221;row&#8221; type=&#8221;full_width&#8221; text_align=&#8221;left&#8221; css_animation=&#8221;&#8221;][vc_column_inner el_class=&#8221;riga_spazio_progetti&#8221;][\/vc_column_inner][\/vc_row_inner][vc_empty_space][vc_column_text]<\/p>\n<h5><span style=\"color: #8bc9e0;\"><strong>CONTACT US<\/strong><\/span><\/h5>\n<p><strong><span style=\"color: #ffffff;\">For more information about this technology, <\/span><a href=\"mailto:tto@lists.infn.it\"><span style=\"text-decoration: underline;\"><strong><span style=\"color: #ffffff; text-decoration: underline;\">WRITE TO US<\/span><\/strong><\/span><\/a><\/strong>[\/vc_column_text][vc_empty_space][\/vc_column][\/vc_row][vc_row css_animation=&#8221;&#8221; row_type=&#8221;row&#8221; use_row_as_full_screen_section=&#8221;no&#8221; type=&#8221;full_width&#8221; angled_section=&#8221;no&#8221; text_align=&#8221;left&#8221; background_image_as_pattern=&#8221;without_pattern&#8221;][vc_column][vc_empty_space height=&#8221;51px&#8221;][\/vc_column][\/vc_row]<\/p>\n<\/div>","protected":false},"excerpt":{"rendered":"<p>[vc_row css_animation=&#8221;&#8221; row_type=&#8221;row&#8221; use_row_as_full_screen_section=&#8221;no&#8221; type=&#8221;full_width&#8221; angled_section=&#8221;no&#8221; text_align=&#8221;left&#8221; background_image_as_pattern=&#8221;without_pattern&#8221;][vc_column][vc_raw_html]W3dwc2VvX2JyZWFkY3J1bWJd[\/vc_raw_html][vc_empty_space][vc_column_text] Plasma source for high repetition rate accelerators [\/vc_column_text][vc_empty_space][\/vc_column][\/vc_row][vc_row css_animation=&#8221;&#8221; row_type=&#8221;row&#8221; use_row_as_full_screen_section=&#8221;no&#8221; type=&#8221;full_width&#8221; angled_section=&#8221;no&#8221; text_align=&#8221;left&#8221; background_image_as_pattern=&#8221;without_pattern&#8221;][vc_column width=&#8221;2\/3&#8243;][vc_empty_space][vc_column_text]The present invention refers to the field of accelerators based on plasma technology. More particularly, the present invention refers to a plasma&#8230;<\/p>\n","protected":false},"author":6,"featured_media":4650,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","portfolio_category":[256,252,255],"portfolio_tag":[],"class_list":["post-4649","portfolio_page","type-portfolio_page","status-publish","has-post-thumbnail","hentry","portfolio_category-accelerators","portfolio_category-patents","portfolio_category-physics"],"acf":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.5 - https:\/\/yoast.com\/product\/yoast-seo-wordpress\/ -->\n<title>Plasma source for high repetition rate accelerators - TechTransfer INFN<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/web.infn.it\/TechTransfer\/en\/portfolio_page\/plasma-source-for-high-repetition-rate-accelerators\/\" \/>\n<meta property=\"og:locale\" content=\"en_US\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Plasma source for high repetition rate accelerators - TechTransfer INFN\" \/>\n<meta property=\"og:description\" content=\"[vc_row css_animation=&#8221;&#8221; row_type=&#8221;row&#8221; use_row_as_full_screen_section=&#8221;no&#8221; type=&#8221;full_width&#8221; angled_section=&#8221;no&#8221; text_align=&#8221;left&#8221; background_image_as_pattern=&#8221;without_pattern&#8221;][vc_column][vc_raw_html]W3dwc2VvX2JyZWFkY3J1bWJd[\/vc_raw_html][vc_empty_space][vc_column_text] Plasma source for high repetition rate accelerators [\/vc_column_text][vc_empty_space][\/vc_column][\/vc_row][vc_row css_animation=&#8221;&#8221; row_type=&#8221;row&#8221; use_row_as_full_screen_section=&#8221;no&#8221; type=&#8221;full_width&#8221; angled_section=&#8221;no&#8221; text_align=&#8221;left&#8221; background_image_as_pattern=&#8221;without_pattern&#8221;][vc_column width=&#8221;2\/3&#8243;][vc_empty_space][vc_column_text]The present invention refers to the field of accelerators based on plasma technology. 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