{"id":3071,"date":"2025-03-27T10:18:17","date_gmt":"2025-03-27T09:18:17","guid":{"rendered":"https:\/\/web.infn.it\/TechTransfer\/?post_type=portfolio_page&#038;p=3071"},"modified":"2025-03-27T10:18:17","modified_gmt":"2025-03-27T09:18:17","slug":"sorgente-di-plasma-per-acceleratori-ad-alta-frequenza-di-ripetizione","status":"publish","type":"portfolio_page","link":"https:\/\/web.infn.it\/TechTransfer\/portfolio_page\/sorgente-di-plasma-per-acceleratori-ad-alta-frequenza-di-ripetizione\/","title":{"rendered":"Sorgente di plasma per acceleratori ad alta frequenza di ripetizione"},"content":{"rendered":"<div class=\"wpb-content-wrapper\"><p>[vc_row css_animation=&#8221;&#8221; row_type=&#8221;row&#8221; use_row_as_full_screen_section=&#8221;no&#8221; type=&#8221;full_width&#8221; angled_section=&#8221;no&#8221; text_align=&#8221;left&#8221; background_image_as_pattern=&#8221;without_pattern&#8221;][vc_column][vc_raw_html]JTVCd3BzZW9fYnJlYWRjcnVtYiU1RA==[\/vc_raw_html][vc_empty_space][vc_column_text]<\/p>\n<h1>Sorgente di plasma per acceleratori ad alta frequenza di ripetizione<\/h1>\n<p>[\/vc_column_text][vc_empty_space][\/vc_column][\/vc_row][vc_row css_animation=&#8221;&#8221; row_type=&#8221;row&#8221; use_row_as_full_screen_section=&#8221;no&#8221; type=&#8221;full_width&#8221; angled_section=&#8221;no&#8221; text_align=&#8221;left&#8221; background_image_as_pattern=&#8221;without_pattern&#8221;][vc_column width=&#8221;2\/3&#8243;][vc_empty_space][vc_column_text]La presente invenzione si riferisce al campo degli acceleratori basati su tecnologia al plasma. Pi\u00f9 in particolare la presente invenzione si riferisce a una sorgente di plasma per acceleratori ad alta frequenza di ripetizione.[\/vc_column_text][vc_empty_space][vc_single_image image=&#8221;3072&#8243; img_size=&#8221;full&#8221; qode_css_animation=&#8221;&#8221;][vc_empty_space][vc_column_text]<\/p>\n<h3><span style=\"color: #20415c;\">Come funziona?<\/span><\/h3>\n<p>[\/vc_column_text][vc_empty_space][vc_column_text]L&#8217;invenzione risolve le criticit\u00e0 legate all\u2019utilizzo di materiali in grado di resistere a temperature dell\u2019ordine di diverse decine di migliaia di gradi, raggiunte durante il processo di formazione di un arco elettrico. Inoltre, la presente invenzione risolve le criticit\u00e0 relative al raggiungimento di elevati valori di energia.<\/p>\n<p>L\u2019invenzione oggetto del brevetto prevede una fase di produzione modulare delle componenti della sorgente di plasma. Detto metodo, unito alla facilit\u00e0 di lavorazione meccanica dei materiali individuati, consente di realizzare sorgenti di plasma comprendenti strutture longitudinali in grado di superare le problematiche esposte.[\/vc_column_text][vc_empty_space][vc_column_text]<\/p>\n<h3><span style=\"color: #20415c;\">Applicazioni<\/span><\/h3>\n<p>[\/vc_column_text][vc_column_text]<\/p>\n<ul>\n<li>Applicazioni nel settore dell\u2019accelerazione di particelle per la realizzazione delle sorgenti di plasma<\/li>\n<\/ul>\n<p>[\/vc_column_text][vc_empty_space][vc_column_text]<\/p>\n<h3><span style=\"color: #20415c;\">Vantaggi<\/span><\/h3>\n<p>[\/vc_column_text][vc_column_text]<\/p>\n<ul>\n<li>Utilizzo a frequenze di ripetizione molto alte (almeno fino a diverse centinaia di Hz).<\/li>\n<li>Allungamento della vita media della sorgente di plasma.<\/li>\n<li>Riduzione dei costi rispetto a materiali come zaffiri o affini.<\/li>\n<\/ul>\n<p>[\/vc_column_text][\/vc_column][vc_column width=&#8221;1\/4&#8243; css=&#8221;.vc_custom_1702567488600{margin-bottom: 50px !important;background-color: #042a48 !important;}&#8221; el_class=&#8221;.column_details_portfolio&#8221;][vc_column_text]<\/p>\n<h4><span style=\"color: #ffffff;\">DETTAGLI AGGIUNTIVI<\/span><\/h4>\n<p>[\/vc_column_text][vc_empty_space][vc_column_text]<\/p>\n<h5><span style=\"color: #8bc9e0;\"><strong>PROPRIETARI DEL BREVETTO<\/strong><\/span><\/h5>\n<p style=\"color: #fff; font-weight: bold;\">INFN e Universit\u00e0 di Roma Sapienza<\/p>\n<p>[\/vc_column_text][vc_empty_space height=&#8221;21px&#8221;][vc_column_text]<\/p>\n<h5><span style=\"color: #8bc9e0;\"><strong>NUMERO DI PRIORIT\u00c0<\/strong><\/span><\/h5>\n<p><strong><span style=\"color: #ffffff;\">IT 102024000027750 <\/span><\/strong>[\/vc_column_text][vc_empty_space height=&#8221;21px&#8221;][vc_column_text]<\/p>\n<h5><span style=\"color: #8bc9e0;\"><strong>SETTORE TECNOLOGICO<\/strong><\/span><\/h5>\n<p><strong><span style=\"color: #ffffff;\">Acceleratori al plasma<\/span><\/strong>[\/vc_column_text][vc_empty_space height=&#8221;21px&#8221;][vc_column_text]<\/p>\n<h5><span style=\"color: #8bc9e0;\"><strong>CODICE TT<\/strong><\/span><\/h5>\n<p><strong><span style=\"color: #ffffff;\">P_24.061<\/span><\/strong>[\/vc_column_text][vc_empty_space][vc_row_inner row_type=&#8221;row&#8221; type=&#8221;full_width&#8221; text_align=&#8221;left&#8221; css_animation=&#8221;&#8221;][vc_column_inner el_class=&#8221;riga_spazio_progetti&#8221;][\/vc_column_inner][\/vc_row_inner][vc_empty_space][vc_column_text]<\/p>\n<h5><span style=\"color: #8bc9e0;\"><strong>CONTATTACI<\/strong><\/span><\/h5>\n<p><strong><span style=\"color: #ffffff;\">Per maggiori informazioni su questa tecnologia, <\/span><a href=\"mailto:tto@lists.infn.it\"><span style=\"text-decoration: underline;\"><strong><span style=\"color: #ffffff; text-decoration: underline;\">SCRIVICI<\/span><\/strong><\/span><\/a><\/strong>[\/vc_column_text][vc_empty_space][\/vc_column][\/vc_row][vc_row css_animation=&#8221;&#8221; row_type=&#8221;row&#8221; use_row_as_full_screen_section=&#8221;no&#8221; type=&#8221;full_width&#8221; angled_section=&#8221;no&#8221; text_align=&#8221;left&#8221; background_image_as_pattern=&#8221;without_pattern&#8221;][vc_column][vc_empty_space height=&#8221;51px&#8221;][\/vc_column][\/vc_row]<\/p>\n<\/div>","protected":false},"excerpt":{"rendered":"<p>[vc_row css_animation=&#8221;&#8221; row_type=&#8221;row&#8221; use_row_as_full_screen_section=&#8221;no&#8221; type=&#8221;full_width&#8221; angled_section=&#8221;no&#8221; text_align=&#8221;left&#8221; background_image_as_pattern=&#8221;without_pattern&#8221;][vc_column][vc_raw_html]JTVCd3BzZW9fYnJlYWRjcnVtYiU1RA==[\/vc_raw_html][vc_empty_space][vc_column_text] Sorgente di plasma per acceleratori ad alta frequenza di ripetizione [\/vc_column_text][vc_empty_space][\/vc_column][\/vc_row][vc_row css_animation=&#8221;&#8221; row_type=&#8221;row&#8221; use_row_as_full_screen_section=&#8221;no&#8221; type=&#8221;full_width&#8221; angled_section=&#8221;no&#8221; text_align=&#8221;left&#8221; background_image_as_pattern=&#8221;without_pattern&#8221;][vc_column width=&#8221;2\/3&#8243;][vc_empty_space][vc_column_text]La presente invenzione si riferisce al campo degli acceleratori basati su tecnologia al plasma. Pi\u00f9 in particolare la presente&#8230;<\/p>\n","protected":false},"author":6,"featured_media":3072,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","portfolio_category":[131,70,130],"portfolio_tag":[],"class_list":["post-3071","portfolio_page","type-portfolio_page","status-publish","has-post-thumbnail","hentry","portfolio_category-acceleratori-brevetti","portfolio_category-brevetti","portfolio_category-fisica-brevetti"],"acf":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.5 - https:\/\/yoast.com\/product\/yoast-seo-wordpress\/ -->\n<title>Sorgente di plasma per acceleratori ad alta frequenza di ripetizione - TechTransfer INFN<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/web.infn.it\/TechTransfer\/portfolio_page\/sorgente-di-plasma-per-acceleratori-ad-alta-frequenza-di-ripetizione\/\" \/>\n<meta property=\"og:locale\" content=\"it_IT\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Sorgente di plasma per acceleratori ad alta frequenza di ripetizione - TechTransfer INFN\" \/>\n<meta property=\"og:description\" content=\"[vc_row css_animation=&#8221;&#8221; row_type=&#8221;row&#8221; use_row_as_full_screen_section=&#8221;no&#8221; type=&#8221;full_width&#8221; angled_section=&#8221;no&#8221; text_align=&#8221;left&#8221; background_image_as_pattern=&#8221;without_pattern&#8221;][vc_column][vc_raw_html]JTVCd3BzZW9fYnJlYWRjcnVtYiU1RA==[\/vc_raw_html][vc_empty_space][vc_column_text] Sorgente di plasma per acceleratori ad alta frequenza di ripetizione [\/vc_column_text][vc_empty_space][\/vc_column][\/vc_row][vc_row css_animation=&#8221;&#8221; row_type=&#8221;row&#8221; use_row_as_full_screen_section=&#8221;no&#8221; type=&#8221;full_width&#8221; angled_section=&#8221;no&#8221; text_align=&#8221;left&#8221; background_image_as_pattern=&#8221;without_pattern&#8221;][vc_column width=&#8221;2\/3&#8243;][vc_empty_space][vc_column_text]La presente invenzione si riferisce al campo degli acceleratori basati su tecnologia al plasma. 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