Magnetron Sputtering

Schematic description of a magnetron sputtering process
Schematic description of a magnetron sputtering process in down-top configuration: in a vacuum chamber inert gas plasma (Ar) is created when a difference in potential is applied between the cathode (the material to be deposited) and the substrate (anode). The positive ions of the inert gas are accelerated toward the cathode. When the ions collide with the atoms of the sputtering target, the energy transfer causes the detachment of some atoms, which are then deposited on the substrate. Magnetron sputtering is characterized by elevated plasma use efficiency due to its magnetic confinement.
Example of plasma during the sputtering process of Molybdenum
Example of plasma during the sputtering process of Molybdenum.

The application of Magnetron Sputtering (MS) technique to obtain a solid target was the subject of an INFN patent (n. WO/2019/053570) and its enhancement was carried out in the framework of INTEFF_TOTEM project. 
MS system seems very promising technique because it allows the deposition of thin and thick layer onto several backing plate materials with a good adhesion. However, the material loss issues should be deeper investigated in order to make this technology attractive for the expensive isotopically enriched materials.

Target Examples
Target Examples

MS advantages:

  • Deposition onto almost any support material
  • Excellent adhesion on substrate
  • High thickness range (0.1 µm – 1 mm)
  • High deposition uniformity
    • More information can be found here:
    • Kotliarenko, A.; Azzolini, O.; Cisternino, S.; El Idrissi, M.; Esposito, J.; Keppel, G.; Pira, C.; Taibi, A. First Results on Zinc Oxide Thick Film Deposition by Inverted Magnetron Sputtering for Cyclotron Solid Targets Production. Materials 2023, 16, 3810, doi:10.3390/ma16103810.
    • Kotliarenko, A.; Azzolini, O.; Keppel, G.; Pira, C.; Esposito, J. Investigation of a Possible Material-Saving Approach of Sputtering Techniques for Radiopharmaceutical Target Production. Applied Sciences 2021, 11, 9219, doi:10.3390/app11199219.
    • Skliarova, H.; Cisternino, S.; Cicoria, G.; Marengo, M.; Cazzola, E.; Gorgoni, G.; Palmieri, V. Medical Cyclotron Solid Target Preparation by Ultrathick Film Magnetron Sputtering Deposition. Instruments 2019, 3, 21, doi:10.3390/instruments3010021.
    • Skliarova, H.; Cisternino, S.; Cicoria, G.; Marengo, M.; Palmieri, V. Innovative Target for Production of Technetium-99m by Biomedical Cyclotron. Molecules 2019, 24, 25, doi:10.3390/molecules24010025.
    • Palmieri, V.; Skliarova, H.; Cisternino, S.; Marengo, M.; Cicoria, G. Method for Obtaining a Solid Target for Radiopharmaceuticals Production. Patent WO/2019/053570. ISTITUTO NAZIONALE DI FISICA NUCLEARE. 22 March 2019.
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