INTEFF_TOTEM (INFN-TT, 2021-2022ì)

INTEFF_INTEFF_TOTEM (INnovazione Tecnologica della Fisica Fondamentale_magneTron sputtering cyclotrOn TargEt Manufacturing TOTEM

Picture of the sputtering vacuum chamber during the deposition test
Picture of the sputtering vacuum chamber during the deposition test.

The INTEFF_TOTEM project was financed as a Call PoC MISE in the framework of “Programma di valorizzazione INnovazione Tecnologica della Fisica Fondamentale” (INTEFF) of INFN. The aim was the enhancement of the INFN patent n. WO 2019/053570 relating to technological R&D to increase the deposition efficiency of suitable materials (Mo, Y, Cr, ZnO) on various substrates (metallic or not) using the Magnetron Sputtering (MS) technique. The aim is to reduce the losses of the source material, in order to make this method attractive also for isotopically enriched materials (usually very expensive and supplied as powder), typically used to produce radioisotopes for nuclear medicine. A first prototype for inverted magnetron sputtering deposition has been  implemented and tested for the deposition of Cr and ZnO. 

In addition, a preliminary study on the manufacturing of the multilayer ZnO target for the production of 67Cu with cyclotrons with 70 MeV protons, as described in a further INFN patent n. WO 2019/220224 A1, has been started.