Home » Design of a dielectric accelerator structure supporting a TE210-like perturbed mode

Design of a dielectric accelerator structure supporting a TE210-like perturbed mode

The invention consists of proposing a method for accelerating subatomic particles (protons and light ions) based on photonic crystal guides integrated on chips capable of guiding optical radiation inside them. These structures are made of dielectric materials that are perturbed to give rise to the axial field component capable of accelerating and bunching charged particles.

How does it work?

The invention concerns a dielectric structure for the confinement of a TE210 (TE210-like) electromagnetic field that is perturbed to give rise to an axial field component capable of accelerating and bunching charged particles. The devised dielectric structure gives the possibility of using dielectric accelerators operating at optical wavelengths for particle acceleration at sub-relativistic speeds, allowing for bunching and the first part of low-energy acceleration to take place between the integrated proton/hadron source and the subsequent high-energy accelerating sections. Such a structure allows for greater miniaturisation and compactness without compromising the efficiency of the device. In fact, among the advantages of this technology, the micro-bunching process takes place at a higher efficiency and the longitudinal field gradients are much wider than with conventional devices.

Applications

  • Medical field;
  • Safety;
  • Industrial field;
  • Energy (Thermonuclear Fusion).

Advantages

  • Possible longitudinal field gradients much higher than metallic RFQs;
  • Compactness/miniaturisation by 4 orders of magnitude;
  • Economies of scale in production;
  • Greater efficiencies in the micro-bunching process, and greater compatibility with subsequent p-DLA sections.

ADDITIONAL DETAILS

PATENT OWNERS

INFN and POLIMI

PRIORITY NUMBER

IT 102021000021158

TECHNOLOGY SECTOR

Chemistry and new materials

TT CODE

P_21.059

CONTACT US

For more information about this technology, WRITE TO US