Plasma source for high repetition rate accelerators

The present invention refers to the field of accelerators based on plasma technology. More particularly, the present invention refers to a plasma source for high repetition rate accelerators.

How does it work?

The invention solves the critical issues related to the use of materials capable of withstanding temperatures of the order of several tens of thousands of degrees, reached during the process for forming an electric arc. Furthermore, the present invention solves the critical issues of achieving high energy values.

The invention covered by the patent involves a modular production step of the plasma source components. Said method, combined with the ease of machining of the materials identified, makes it possible to create plasma sources comprising longitudinal structures capable of overcoming the outlined problems.

Applications

• Applications in the field of particle acceleration for the realisation of plasma sources

Advantages

• Use at very high repetition rates (at least up to several hundred Hz).
• Extension of the average life of the plasma source.
• Cost reduction compared to materials such as sapphires or similar.