A system for the deposition of thin films, by magnetron sputtering technique, on the inner surface of a cavity called a substrate. The system comprises a cathode (target), consisting of the base material to be deposited, and an innovative rotating magnetic structure. Thanks to the particular configuration, the magnetic structure is unique for both the inner and outer parts of the cathode.

The invention originates as a solution to the technical problem of deposition by magnetron sputtering inside cavities; however, its use can be extended to all objects with complex geometry characterized by two coaxial cylinders joined at one end and which must be coated with a thin film of uniform thickness.
The invention consists of a target of the material to be deposited consisting of two concentric tubes joined together in the upper part. An innovative magnetic structure is built into the inner cavity, which allows the plasma to be confined to the inner surface of the tube with a smaller target diameter and to the outer surface of the tube with a larger diameter. The particular magnetic configuration, which varies according to the application, allows for a single plasma confinement and, by means of a mechanism that rotates the magnets, moves the plasma over the entire cathode so as to ensure high uniformity of deposition.
INFN
IT 102015902335212
Processing of materials
P_14.009
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