SOLID TARGET FOR RADIOPHARMACEUTICALS PRODUCTION

Solid Target | Radiopharmaceuticals| Magnetron Sputtering | Brazing | Ultra-thick films

INTRODUCTION

The increase of the production yield of a radionuclide for medical application requires to perform irradiation at high cyclotron currents. In order to support these currents, the cyclotron target should be realized using materials with excellent thermal properties and optimal contact between them. A method to realize a solid target with high level of thermal exchange for the production of 99mTc by cyclotron was developed. The target is based on an non-metallic inert backing plate with high thermal conductivity. The ultra-thick film of Mo, the precursor for the Tc production, is deposited directly on the backing plate by magnetron sputtering technique.

TECHNICAL FEATURES

The backing plate of the target is realized by brazing in vacuum a thin layer of dielectric and chemically inert component to a metallic one with a high thermal conductivity. The deposition of the precursor material (for example 100Mo for 99mTc production, 89Y for the production of 89Zr, etc.) is realized through the magnetron sputtering technique in order to obtain a high density and uniformity film with good adherence directly onto the inert substrate. The parameters used for the magnetron sputtering, in particular inert gas pressure, substrate temperature and multilayer deposition, should be optimized in order to minimize the total stress in the system and guarantee extremely high thickness of the film (100µm-1mm).

POSSIBLE APPLICATIONS

100Mo, 89Y, 52Cr, nat,63Cu targets for 99mTc, 89Zr, 52Mn, 62,63Zn production;
Backing plate of solid target for the production of radionuclides at high cyclotron currents;
Thick films of refractory metals, like Nb for SRF cavities of Cu, otherwise W for graphite components of Tokamak, etc.

ADVANTAGES

High thermomechanical resistance of the target;
Possibility to use high cyclotron current in order to increase the yield of the radionuclide production;
Inert backing plate guarantees the absence of impurities;
Complex backing plate brazed in vacuum allows to reduce the costs of the target.

PATENT INFORMATION

PATENT OWNER

Istituto Nazionale di Fisica Nucleare

PATENT STATUS

Deposited

PRIORITY NUMBER

102017000102990

PRIORITY DATE

14/09/2017

LICENSE

Italy - Europe

COMMERCIAL RIGHTS

Exclusive

AVAILABILITY

Available

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